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About the Fluorine Chemistry in MCVD: The Influence of Fluorine Doping on SiO 2 Deposition
Author(s) -
Kirchhof Johannes,
Kleinert Peter,
Unger Sonja,
Funke A.
Publication year - 1986
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170211113
Subject(s) - fluorine , doping , chemical vapor deposition , chemistry , dopant , deposition (geology) , quartz , inorganic chemistry , chemical engineering , materials science , organic chemistry , optoelectronics , composite material , paleontology , sediment , engineering , biology
In the fabrication of quartz glass fibers for optical communication, fluorine doping gets increasing importance. In contrast to other dopants, fluorine influences the deposition of SiO 2 in Modified Chemical Vapour Deposition. An equation is derived from considerations of equilibrium chemistry which yields the deposition efficiency of SiO 2 as function of fluorine doping. It is compared with experimental results.