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AES Depth Profiling of Nitrogen Implanted Fe(001)
Author(s) -
Zemek Josef,
Van Phac Le,
Král Jaroslav
Publication year - 1986
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170210520
Subject(s) - auger electron spectroscopy , nitrogen , ion , auger , nitride , analytical chemistry (journal) , materials science , chemistry , atomic physics , nanotechnology , layer (electronics) , physics , organic chemistry , nuclear physics , chromatography
Auger electron spectroscopy (AES) combined with a well controlled ion mill is applied for the study of nitrogen implanted (N + 2 ions, 120 keV) into iron single crystals in doses ranging from 8 × 10 16 to 5 × 10 17 N‐atoms/cm 2 , also with subsequent heat treatment. The nitrogen depth profiles are Gaussian‐like in shape for doses up to 1.5 × 10 17 N‐atoms/cm 2 . Athigher doses deviations are observed. The nitride bonding state was indicated but a part of the implanted nitrogen appears to be weakly bonded.
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