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Thin film diffusion studied by high temperature electron probe microanalysis
Author(s) -
Berndt K.,
Karin H.
Publication year - 1985
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170201107
Subject(s) - electron microprobe , electron probe microanalysis , microanalysis , diffusion , nichrome , microprobe , analytical chemistry (journal) , thermal diffusivity , electron , thin film , materials science , activation energy , chemistry , intensity (physics) , mineralogy , metallurgy , optics , nanotechnology , thermodynamics , physics , organic chemistry , chromatography , quantum mechanics
Diffusion in Thin Film Systems (TFS) can be studied effectively by means of Electron Probe Microanalysis (EPMA). Using a heating stage in the microprobe the diffusion process in the NiCr/Al TFS was studied by the continuous detection of the Ni‐, Cr‐ and Al‐X‐ray intensity. For the case of long diffusion times and taking into account the specific features of the depth distribution of the excited X‐rays the volume diffusion coefficient, frequency factor and activation energy for the Ni diffusion in Al were determined. Results for NiCrAl interdiffusion will be submitted.