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A new method for determining the thickness and composition of thin layers by electron probe microanalysis
Author(s) -
Hunger H.J.,
Baumann W.,
Schulze S.
Publication year - 1985
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170201102
Subject(s) - electron microprobe , microanalysis , electron probe microanalysis , calibration , substrate (aquarium) , composition (language) , electron , materials science , thin layers , analytical chemistry (journal) , optics , mineralogy , chemistry , physics , geology , metallurgy , composite material , chromatography , nuclear physics , linguistics , philosophy , oceanography , organic chemistry , quantum mechanics
A new method is described which allows the determination of thickness and composition of thin layers by EPMA simultaneously. The method is based on new depth distribution functions of the characteristic X‐rays and on a substrate correction which was developed by the authors. The test of this method with the aid of wellknown layers gives very good results. The method works with massive standards. Layers for calibration are not needed.