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Liquid‐phase epitaxy of Potassium Niobate
Author(s) -
Khachaturyan O. A.,
Madoyan R. S.
Publication year - 1984
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170190405
Subject(s) - epitaxy , wafer , materials science , heterojunction , substrate (aquarium) , corundum , potassium niobate , phase (matter) , potassium , layer (electronics) , optoelectronics , mineralogy , chemistry , nanotechnology , metallurgy , ferroelectricity , oceanography , organic chemistry , geology , dielectric
The possibility of potassium niobate films growing by means of liquid phase epitaxy technique was investigated. The physical and chemical analyses of K 2 O‐V 2 O 5 ‐Nb 2 O 5 system were carried out. Corundum wafers with {1¯210} and {0001} orientations served as substrates. The grown films were 10–30 μm thick. The grown heterostructures had a sharp, phase boundary line substrate‐film. Epitaxial layer perfection was investigated by X‐ray and electronographic methods.