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A combination of oscillating slit and oscillating film techniques for the investigation of lattice defects
Author(s) -
Auleytner J.,
Furmanik Z.
Publication year - 1983
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170180225
Subject(s) - crystal (programming language) , oscillation (cell signaling) , slit , optics , lattice (music) , position (finance) , materials science , interference (communication) , surface (topology) , crystal structure , line (geometry) , physics , molecular physics , crystallography , chemistry , geometry , mathematics , computer science , acoustics , computer network , biochemistry , channel (broadcasting) , finance , economics , programming language
A combination of oscillating slit and oscillating film techniques is described. This X‐ray topographical method allows reflections due to the same places on the crystal surface to be recorded first in form of a topogramme registrated on the oscillating film set in the parallel position to the crystal surface. Second on the stationary film set parallel to the crystal surface in the form of an interference line Kα 1 or Kß outgoing from the investigated area and registrated on the first topogramme at the fixed angular position of the crystal and slit and next, recorded separate on the oscillating film and on the stationary film set in the distance of 50 mm from the crystal (oscillation axis). As an example a serie of photographs corresponding to four types of pattern obtained in the case of a PbSnTe crystal with small angle boundaries are presented.