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Effect of electrode annealing on the aging characteristics of thin metal films
Author(s) -
Patel A. R.,
Pandya N. C.,
Chourasia N. C.,
Shivakumar G. K.
Publication year - 1982
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170171112
Subject(s) - annealing (glass) , materials science , electrode , copper , indium , aluminium , thin film , metal , chromium oxide , metallurgy , oxide , chromium , alloy , composite material , nanotechnology , chemistry
The resistance of thin films of silver, copper, indium and aluminium deposited onto clean glass substrates were measured using annealed and unannealed films of chromium‐copper alloy as electrodes. The percentage variation in resistance for different metal films differ with annealed and unannealed electrodes. Formation of oxide and alloying at the electrodefilm junction are discussed taking into account the observed variations in resistance. Microscopic observations are also made of the film‐electrode junctions.