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Problems of surface morphology and layer deposition during plasma etching processes (III) SiO 2 ‐etching in CF 4 plasma
Author(s) -
Tiller H.J.,
Krausse J.
Publication year - 1982
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170170918
Subject(s) - tiller (botany) , etching (microfabrication) , plasma etching , layer (electronics) , materials science , philosophy , nanotechnology , agronomy , biology