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On the Codepositon of Silicon and Boron (II) The Influence of Traces of Water Vapour on the Codepostion of Silicon and Boron
Author(s) -
Bartsch K.,
Wolf E.
Publication year - 1982
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.2170170403
Subject(s) - boron , silicon , halide , inorganic chemistry , materials science , boro , chemistry , metallurgy , organic chemistry
It has been proved experimentally that at the codeposition of silicoan and boron at low concentrations of boron, being comparable with the residual water vapour of the gases, gaseous phase reactions ake place, decreasing the incorporation of boron in the deposited silicon. Probably silioxy‐boron‐halides are formed in these reactions.