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A Case Study to Address: “Is Your Pulsed Laser Deposition Chamber Clean?”
Author(s) -
Dumen Manish,
Kaur Ripudaman,
Goyal Saveena,
Tomar Ruchi,
Wadehra Neha,
Chakraverty Suvankar
Publication year - 2021
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.202000186
Subject(s) - pulsed laser deposition , superlattice , deposition (geology) , thin film , materials science , vacuum chamber , oxide , optoelectronics , laser , pulsed laser , chemical engineering , nanotechnology , analytical chemistry (journal) , chemistry , optics , composite material , physics , engineering , metallurgy , chromatography , paleontology , sediment , biology
Pulsed laser deposition (PLD) is one of the important techniques for the growth of oxide thin films, interfaces, and superlattices. It can also be utilized to implement diverse combinatorial approaches. Thin film growth using PLD hinges on various parameters that decide the composition, structure, quality, and finally the physical properties of the films, interfaces, and superlattices. In this paper it is demonstrated how the growth conditions inside the chamber during the growth can be judged from outside by combining in situ and ex situ techniques. An example of the growth of LaVO 3 ‐SrTiO 3 interface is given to elucidate the effect of repetitive growth on the chamber condition and hence on the reproducibility of the physical properties of the samples. The experiments suggest noticeable change in transport properties with successive deposition processes.