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Implications of Crystal Structure on Organotin Carboxylate Photoresists †
Author(s) -
Sharps Meredith C.,
Marsh David A.,
Zakharov Lev N.,
Hutchison James E.,
Johnson Darren W.
Publication year - 2017
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.201700081
Subject(s) - carboxylate , steric effects , resist , intermolecular force , chemistry , formate , crystal structure , crystallography , single crystal , crystal (programming language) , diffraction , materials science , stereochemistry , molecule , organic chemistry , catalysis , optics , physics , layer (electronics) , computer science , programming language
A series of five organotin carboxylates of the type [RSn(O)O 2 CR’] 6 containing n ‐butyl ligands and carboxylates ranging in size from formate to diphenylacetate were synthesized and examined by single crystal X‐ray diffraction. The crystal and packing structures of each compound were compared with regards to the steric and intermolecular forces of the varying carboxylate groups in order to aid the understanding of how these same factors relate to irradiation trends in EUV lithography of thin films. The trends found are compared to other factors that may also dictate resist formation in order to elucidate a fuller picture of the chemical transformations that occur when patterning inorganic materials.