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Temperature quenching of photoluminescence of ordered GaInP 2 alloy under different excitation densities
Author(s) -
Prutskij T.,
Pelosi C.,
Attolini G.
Publication year - 2011
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.201000523
Subject(s) - photoluminescence , excitation , quenching (fluorescence) , materials science , alloy , intensity (physics) , layer (electronics) , recombination , emission intensity , band gap , condensed matter physics , molecular physics , optoelectronics , chemistry , optics , fluorescence , nanotechnology , physics , biochemistry , quantum mechanics , gene , composite material
The photoluminescence (PL) emission from an epi‐structure containing an atomically ordered GaInP 2 layer and a GaAs layer was studied under excitation power densities of 0.03 – 3 W/cm 2 at temperatures of 10 to 300 K. The quenching of the integrated PL intensity from both: the GaInP 2 and the GaAs layers is stronger under low excitation, than under high excitation density. The temperature dependence, however, have different shapes being the PL decay observed for the GaInP 2 layer stronger than that for the GaAs layer. Comparing the temperature dependence of the PL intensity from the ordered GaInP 2 and the GaAs layers under different excitation densities and analyzing them together, we conclude that the inhomogeneity of the ordered layer is responsible for the different temperature behavior of the GaInP 2 alloy PL emission. To explain the experimentally observed PL intensity temperature dependence an additional nonradiative recombination mechanism due to a thermally activated escape of the carriers from its confinement within regions of lower bandgap has to be taken into account. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)