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Defect structure and optical damage resistance of Hf:Fe:LiNbO 3 crystals with various [Li]/[Nb] ratios
Author(s) -
Sun Xiudong,
Shi Hongxin,
Luo Suhua,
Jiang Yongyuan,
Meng Qingxin
Publication year - 2010
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.200900620
Subject(s) - birefringence , materials science , czochralski method , doping , lithium niobate , ion , infrared spectroscopy , infrared , distortion (music) , spectroscopy , optoelectronics , analytical chemistry (journal) , optics , chemistry , physics , organic chemistry , quantum mechanics , chromatography , amplifier , cmos
Hf:Fe:LiNbO 3 crystals were grown in air by the Czochralski technique with various ratios of [Li]/[Nb]=0.94, 1.05, 1.20 in melt. The defect structure and location of doped ions were analyzed by the UV‐visible and infrared spectroscopy. The optical damage resistance ability of Hf:Fe:LiNbO 3 crystals was measured by the photo‐induced birefringence change and the transmitted light spot distortion method. The results show that the optical damage resistance ability of Hf:Fe:LiNbO 3 crystals is enhanced with the increase of the [Li]/[Nb] ratio. The dependence of the optical damage resistance of Hf:Fe:LiNbO 3 crystals on the defect structure is discussed in detail. (© 2010 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)