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Structural, microchemical and superconducting properties of ultrathin NbN films on silicon
Author(s) -
Schneider R.,
Freitag B.,
Gerthsen D.,
Ilin K. S.,
Siegel M.
Publication year - 2009
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.200900462
Subject(s) - materials science , thin film , superconductivity , electron energy loss spectroscopy , transmission electron microscopy , silicon , sputter deposition , bolometer , spectroscopy , sputtering , optoelectronics , high resolution transmission electron microscopy , electron diffraction , nanotechnology , diffraction , optics , condensed matter physics , detector , physics , quantum mechanics
Structural, chemical and superconducting properties of thin NbN films used for development of fast and sensitive hot‐electron bolometer (HEB) detectors for wide spectra range are reported. The thin NbN films with a thickness between 4 and 10 nm were deposited on the (001)Si substrates by magnetron sputtering. In order to investigate the film morphology and microchemistry, diffraction‐contrast and high‐resolution transmission electron microscopy (TEM) in combination with scanning TEM and electron energy loss spectroscopy (EELS) were performed. In addition, the zero‐resistance critical temperature of the NbN films was measured and correlated to their thickness. The interrelations between fabrication conditions, crystalline and superconducting properties of the differently thick NbN films are discussed. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)