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Influence of substrate temperature on the structure of ZnO:Al thin films
Author(s) -
Rozati S. M.,
Akeste Sh.
Publication year - 2008
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.200711055
Subject(s) - substrate (aquarium) , materials science , chemical engineering , thin film , transmittance , pyrolysis , sheet resistance , composite material , optoelectronics , nanotechnology , layer (electronics) , oceanography , geology , engineering
ZnO: Al films were prepared using low cost spray pyrolysis technique. The dependence of the physical properties on the substrate temperature was studied. The best films obtained at 500°C substrate temperature with preferred [002] orientation. The sheet resistance decreases with increased substrate temperature, and values as low as R sh = 207 Ω/cm 2 are reached for substrate temperature of 500°C. The optical transmittance of films increased by increasing the substrate temperature and received to 75% at 500°C. (© 2007 WILEY ‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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