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Heat treatment induced structural and optical properties of rf magnetron sputtered tantalum oxide films
Author(s) -
Jagadeesh Chandra S. V.,
Mohan Rao G.,
Uthanna S.
Publication year - 2007
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.200610815
Subject(s) - tantalum , annealing (glass) , sputter deposition , sputtering , materials science , oxide , cavity magnetron , partial pressure , silicon , quartz , analytical chemistry (journal) , thin film , metallurgy , optoelectronics , oxygen , chemistry , nanotechnology , organic chemistry , chromatography
Rf magnetron sputtering technique was employed for preparation of tantalum oxide films on quartz and crystalline silicon (111) substrates held at room temperature by sputtering of tantalum in an oxygen partial pressure of 1x10 ‐4 mbar. The films were annealed in air for an hour in the temperature range 573 – 993 K. The effect of annealing on the chemical binding configuration, structure and optical absorption of tantalum oxide films was systematically studied. (© 2007 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)