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Formation of diffusion‐hindering interlayers in metals in contact by dedicated thermal treatment
Author(s) -
Meyer D. C.,
Gorbunov A.,
Pompe W.,
Levin A. A.
Publication year - 2005
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.200410315
Subject(s) - feal , intermetallic , annealing (glass) , thermal treatment , thermal , materials science , scattering , thermal diffusivity , analytical chemistry (journal) , reflectometry , chemical engineering , chemistry , metallurgy , alloy , composite material , optics , thermodynamics , physics , chromatography , engineering , time domain , computer science , computer vision
Thermal evolution of the structure of Fe/Al multilayers (MLs) with nominal composition 5*(5 nm Al / 5 nm Fe) prepared by crossed‐beam pulsed laser deposition is studied by wide‐angle X‐ray scattering and X‐ray reflectometry after different temperature‐time procedures of thermal treatments under high‐vacuum conditions. In comparison to direct thermal annealing at temperatures of 250 °C and 275 °C, respectively, which results in nearly complete mixing of the MLs and formation of the FeAl intermetallic compound, quite different behaviour was found after dedicated thermal pretreatment. Annealing at successive growing temperatures before final annealing at temperatures mentioned, resulted in conservation of pronounced multilayer structure. From the results it is generalised, that also in the case of ML systems, the tendency of mixing a dedicated tuning of interface characteristics by thermal treatment allows for formation of diffusion‐hindering interlayers. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)