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Electrophysical properties of double‐layer nickel‐base and vanadium‐base films within the intermediate temperature range
Author(s) -
Chornous A.,
Protsenko I.,
Shpetnyi I.
Publication year - 2004
Publication title -
crystal research and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0232-1300
DOI - 10.1002/crat.200310231
Subject(s) - vanadium , atmospheric temperature range , temperature coefficient , transmission electron microscopy , nickel , chemistry , base (topology) , layer (electronics) , phase (matter) , materials science , analytical chemistry (journal) , thermodynamics , metallurgy , inorganic chemistry , nanotechnology , composite material , physics , organic chemistry , mathematical analysis , mathematics
Abstract Phase composition of the double‐layer Ni‐base and V‐base films obtained and annealed in vacuum of 10 ‐4 –10 ‐5 Pa within the temperature range of 700–900 K is studied by technique of electronography and transmission electron microscopy. Temperature dependence of resistance and temperature coefficient of resistance (TCR) was investigated. Comparison of TCR experimental data with the calculated data was made at T = 300 K on basis of semiclassical and macroscopic models and formula for TCR of alloys. (© 2004 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)