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Roger Newman (editor). Fine Line Lithography. Editor: F. F. Y. Wang. North‐Holland Publishing Company, Amsterdam–New York–Oxford 1980 481 Seiten mit 323 Abbildungen, 30 Tabellen und 537 Literaturzitaten. Preis US $ 92,75/Dfl. 190,00
Author(s) -
Neumann H.
Publication year - 1981
Publication title -
kristall und technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0023-4753
DOI - 10.1002/crat.19810161017
Subject(s) - publishing , citation , library science , history , engineering physics , humanities , art history , art , computer science , physics , literature
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