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Investigation of plasma interaction with carbon impurities on SiO 2 ‐ and Al 2 O 3 surfaces by EPR‐, Mass‐ and emission spectroscopy
Author(s) -
Tiller H.J.,
Breitbarth F.W.,
Langguth B.,
Göbel R.,
Berg D.,
Rudakoff G.
Publication year - 1981
Publication title -
kristall und technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0023-4753
DOI - 10.1002/crat.19810160315
Subject(s) - impurity , plasma , electron paramagnetic resonance , carbon fibers , spectroscopy , mass spectrometry , chemistry , analytical chemistry (journal) , materials science , nuclear magnetic resonance , organic chemistry , chromatography , physics , quantum mechanics , composite number , composite material
Carbon impurities on highly disperse SiO 2 and Al 2 O 3 are detected by their interaction with low pressure plasmas, with aid of mass‐, emission‐ and epr‐spectroscopic methods. The formation of surface defects on SiO 2 by plasma treatment is strongly influenced by these impurities. Some of these defects are caused by the impurities also. These effects depend on the time of plasma interaction and on plasma gas, where Ar, O 2 , H 2 and CO plasmas are investigated. By H 2 plasma and the reaction products of the other mentioned above plasmas a partial hydrogenation of the carbon impurities is detected.