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About the oxidation of SiCl 4 and GeCl 4 in homogeneous gaseous phase
Author(s) -
Kleinert P.,
Schmidt D.,
Kirchhof J.,
Funke A.
Publication year - 1980
Publication title -
kristall und technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0023-4753
DOI - 10.1002/crat.19800150918
Subject(s) - homogeneous , physics , chemistry , thermodynamics