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Chemical lap polishing of PbTe and Pb 1− x Sn x Te crystals
Author(s) -
Breitsameter B.,
Hartmann W.,
Löwe H.
Publication year - 1980
Publication title -
kristall und technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0023-4753
DOI - 10.1002/crat.19800150415
Subject(s) - polishing , potassium hydroxide , sodium hydroxide , potassium , sodium , surface roughness , hydroxide , glycerol , chemistry , materials science , molar ratio , inorganic chemistry , metallurgy , composite material , catalysis , organic chemistry
Chemical lap polishing of PbTe and Pb 1− x Sn x Te crystals is investigated. A mixture of potassium hexacyanoferrate (III), sodium hydroxide, glycerol and water is used as a polish. The effect of various parameters of the process on the quality of the surface and on the rate of material removal is studied. The quality of the surface is strongly is strongly affected by the composition of the polish. The roughness increases with rising sodium hydroxide concentration but decreases with rising glycerol concentration. If the molar ratio of sodium hydroxide and potassium hexacyanoferrate (III) exceeds the value 0.5 etch figures are formed. The rate of material removal largely depends on the velocity of the relative movement between specimen and cloth, the rate of supply of polishing solution and on the concentration of sodium hydroxide.