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Etching of GaP surfaces in Aqua regia and in the Bromine‐methanol‐water system
Author(s) -
Somogyi M.,
Schiller V.
Publication year - 1978
Publication title -
kristall und technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0023-4753
DOI - 10.1002/crat.19780130309
Subject(s) - aqua regia , bromine , dissolution , methanol , etching (microfabrication) , chemistry , solvent , plane (geometry) , layer (electronics) , analytical chemistry (journal) , materials science , environmental chemistry , organic chemistry , geometry , mathematics , metal
The etchants aqua regia and bromine in methanol in water and in methanol water mixtures were tested on GaP. Aqua regia acted as nonpreferential etchant on (111) B and on {100} planes, the (111) A plane proved to be more resistent to chemical attack. Indications to the formation of a protecting layer was found. Bromine in methanol proved to be preferential etchant for the {100} plane producing a surface geometry characteristic to kinetically determined processes. Increasing the amount of water the (111) B plane could be dissolved also and etch figures characteristic to nonpreferential dissolution began to appear on the {100} and (111) B planes as well. The preferential effect for the {100} plane seems to be related to the water content of the solvent.