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Composition, microstructure and mechanical properties of chemically vapour‐deposited tantalum
Author(s) -
Jerreat D. J.,
Rawlings Rees D.
Publication year - 1976
Publication title -
kristall und technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0023-4753
DOI - 10.1002/crat.19760110806
Subject(s) - tantalum , materials science , microstructure , silicon , impurity , substrate (aquarium) , foil method , quartz , diffusion , phase (matter) , chemical vapor deposition , mass transport , chemical engineering , deposition (geology) , metallurgy , mineralogy , analytical chemistry (journal) , composite material , nanotechnology , chemistry , chromatography , oceanography , physics , organic chemistry , thermodynamics , geology , paleontology , engineering physics , sediment , biology , engineering
The paper reports the results of a structural investigation of C.V.D. tantalum, which had been deposited on a silica substrate. Deposits at 1000°C were high impurity powders or flakes, at 1100°C (normal deposition temperature) foil‐like, these containing much lower silicon contents, being concentrated near the substrate and coming from there by diffusion. The overall silicon content is reported to be due to other kinds of mass transport (i. e. vapour phase transport) and reactions (e.g. Ta with quartz). — Details on the structure and hardness of the Ta layers are given.