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The change of the lattice constant in heteroepitaxial silver films with increase of thickness
Author(s) -
Sheftal R. N.
Publication year - 1971
Publication title -
kristall und technik
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.377
H-Index - 64
eISSN - 1521-4079
pISSN - 0023-4753
DOI - 10.1002/crat.19710060510
Subject(s) - lattice constant , nucleation , torr , lattice (music) , materials science , condensed matter physics , thin film , analytical chemistry (journal) , chemistry , optics , thermodynamics , nanotechnology , diffraction , physics , chromatography , acoustics
Deposition of silver on NaCl, KCl, and LiF with 20 Å · s −1 in vacuum (5 · 10 −6 torr) and electronographical determination of changes of lattice constant. Precision of measurement better than ± 0.004 Å (reflections {400} and {220}). Thickness of films from 50 to 500 Å with intervals of 10 Å. The lattice parameter of films till to 115 Å in thickness did'nt differ from the parameter of bulk silver (4.086 Å). At about 175 Å the parameter reached minimum (about 4.00 Å) and took again the parameter of bulk material with the film thickness of 215 Å. With polycrystals no changes of lattice parameters occurred. – The phenomenon is connected to growth mechanism, two‐dimensional and three‐dimensional nucleation and to the differences in lattice parameters of substrate and deposit.