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Fabrication of a Robust Tantalum Nitride Photoanode from a Flame‐Heating‐Derived Compact Oxide Film
Author(s) -
Shao Chenyi,
Han Jingfeng,
Liu Guiji,
Wang Zhiliang,
Zhao Yongle,
Zong Xu,
Li Can
Publication year - 2018
Publication title -
chemphotochem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.13
H-Index - 18
ISSN - 2367-0932
DOI - 10.1002/cptc.201700178
Subject(s) - materials science , photocurrent , tantalum nitride , chemical engineering , fabrication , nitride , conductivity , oxide , substrate (aquarium) , layer (electronics) , water splitting , nanotechnology , tantalum , optoelectronics , photocatalysis , metallurgy , organic chemistry , chemistry , medicine , alternative medicine , pathology , engineering , oceanography , geology , catalysis
Photoelectrochemical (PEC) water splitting provides an attractive way of converting solar energy into hydrogen energy. To make this approach practical, it is crucial to develop strategies that can be used to fabricate efficient photoelectrodes in a scalable manner. Herein, we report a rapid flame heating method to prepare a Ta 2 O 5 precursor film for a Ta 3 N 5 photoanode. By varying the parameters of flame heating, rational control over the physicochemical nature of the Ta 2 O 5 precursor film can be realized. With the following nitridation treatment, the compact precursor film can be transformed into a tight‐knit Ta 3 N 5 ‐based nitride film which strongly stuck to the underlying conductive Ta substrate. As a result of the close interfacial connections and reasonable conductivity achieved through the manipulation of the duration of flame heating, an enhanced charge‐separation efficiency was obtained for the as‐prepared Ta 3 N 5 photoanode. Furthermore, with the help of a ferrihydrite layer, the photocurrent density for PEC water oxidation on the optimum Ta 3 N 5 photoanode reached circa 3.53 mA cm −2 at 1.23 V vs. RHE, which is among the best values reported for planar Ta 3 N 5 ‐based photoanodes. This report highlights the advantages of flame heating over traditional heating methods for preparing precursor films for further processing or functionalization.