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Formation of Titanium Nitride, Titanium Carbide, and Silicon Carbide Surfaces by High Power Femtosecond Laser Treatment
Author(s) -
Fedorov Rostislav,
Lederle Felix,
Li Mingji,
Olszok Vinzent,
Wöbbeking Karl,
Schade Wolfgang,
Hübner Eike G.
Publication year - 2021
Publication title -
chempluschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.801
H-Index - 61
ISSN - 2192-6506
DOI - 10.1002/cplu.202100205
Subject(s) - titanium , materials science , tin , titanium nitride , titanium carbide , femtosecond , carbide , laser , silicon carbide , nitride , metallurgy , nanotechnology , optics , layer (electronics) , physics
Abstract Invited for this month's cover is the group of Prof. Eike G. Hübner at Fraunhofer Heinrich Hertz Institute HHI, Goslar and Clausthal University of Technology, Clausthal‐Zellerfeld, Germany. The cover picture shows a titanium plate, on which the crystal structure (golden circle=Ti, blue circle=O/N/C) of isomorphous TiO, TiN or TiC, respectively, has been engraved by a high‐power high pulse repetition rate femtosecond laser process. The process allows for a fast and spatially resolved surface transformation of titanium to golden TiN, blue TiO/TiO 2 or black TiC in an atmosphere of nitrogen, air or ethene/argon. The background represents a typical surface microstructure of these interstitial compounds obtained during this transformation. Read the full text of the article at 10.1002/cplu.202100118.