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Polyoxometalate Complexes as Precursors to Vanadium‐Doped Molybdenum or Tungsten Oxide Thin Films by Means of Aerosol‐Assisted Chemical Vapour Deposition
Author(s) -
Ponja Sapna D.,
Sathasivam Sanjayan,
Davies Hywel O.,
Parkin Ivan P.,
Carmalt Claire J.
Publication year - 2016
Publication title -
chempluschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.801
H-Index - 61
ISSN - 2192-6506
DOI - 10.1002/cplu.201500461
Subject(s) - polyoxometalate , tungsten , vanadium , molybdenum , inorganic chemistry , chemical vapor deposition , tungsten oxide , doping , vanadium oxide , thin film , tungsten compounds , materials science , molybdenum oxide , aerosol , oxide , deposition (geology) , chemistry , nanotechnology , organic chemistry , catalysis , metallurgy , paleontology , optoelectronics , sediment , biology
Aerosol‐assisted chemical vapour deposition of substituted polyoxometalates H 4 [PMo 11 VO 40 ], H 7 [PMo 8 V 4 O 40 ], [ n Bu 4 N] 4 [PVW 11 O 40 ] and [ n Bu 4 N] 5 [PV 2 W 10 O 40 ] resulted in the formation of vanadium‐doped metal oxide thin films. Depositions were carried out at 550 °C in methanol or acetonitrile for the POMs that contained molybdenum or tungsten, respectively. The as‐deposited films were X‐ray amorphous and relatively non‐adherent. However, on annealing in air at 600 °C, decolourised translucent films that were more mechanically robust were obtained. Films deposited from H 4 [PMo 11 VO 40 ] and H 7 [PMo 8 V 4 O 40 ] consisted of V‐doped MoO 3 in the orthorhombic phase and films from [ n Bu 4 N] 4 [PVW 11 O 40 ] and [ n Bu 4 N] 5 [PV 2 W 10 O 40 ] comprised of monoclinic V‐doped WO 3 . All films were fully characterised by using X‐ray photoelectron spectroscopy, energy‐dispersive X‐ray diffraction, scanning electron microscopy and UV/Vis spectroscopy.