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A Combinatorial Study of Photoelectrochemical Properties of Fe‐W‐O Thin Films
Author(s) -
Sliozberg Kirill,
Schäfer Dominik.,
Meyer Robert,
Ludwig Alfred,
Schuhmann Wolfgang
Publication year - 2015
Publication title -
chempluschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.801
H-Index - 61
ISSN - 2192-6506
DOI - 10.1002/cplu.201402277
Subject(s) - photocurrent , scanning electron microscope , materials science , thin film , band gap , spectroscopy , tungsten , analytical chemistry (journal) , sputtering , photoelectrochemistry , photoelectrochemical cell , nanotechnology , chemistry , electrode , electrolyte , optoelectronics , electrochemistry , metallurgy , composite material , physics , chromatography , quantum mechanics
A continuous mixed Fe‐W‐O thin‐films materials library was fabricated by means of reactive co‐sputtering from elemental iron and tungsten targets in argon/oxygen. The materials library was screened for its local photoelectrochemical properties by using an automated optical scanning droplet cell. Local scanning electron microscopy (SEM) and electron‐dispersive X‐ray spectroscopy (EDX) measurements of the materials library were performed to correlate the composition, morphology, and photocurrents. The iron content was varied in the range from Fe 32 W 68 O x to Fe 81 W 19 O x . A strong dependence of the film morphology and the measured photocurrents on the composition was observed with a maximal photocurrent from a measurement area containing 55 at % iron. The most photoactive area showed a porous structure with a high surface area. The bandgap values of these materials were assessed by photocurrent spectroscopy and showed a systematic variation of the bandgap values with the composition.