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From Femtosecond to Nanosecond Laser Microstructuring of Conical Aluminum Surfaces by Reactive Gas Assisted Laser Ablation
Author(s) -
Rauh Simon,
Wöbbeking Karl,
Li Mingji,
Schade Wolfgang,
Hübner Eike G.
Publication year - 2020
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.202000617
Subject(s) - femtosecond , laser , nanosecond , materials science , laser ablation , x ray laser , ablation , aluminium , reactive ion etching , optoelectronics , laser power scaling , optics , analytical chemistry (journal) , etching (microfabrication) , nanotechnology , chemistry , physics , engineering , layer (electronics) , chromatography , metallurgy , aerospace engineering
The Cover Feature illustrates the transition from femtosecond to nanosecond laser microstructuring by compensating the reduced laser peak power with chemical etching processes. On aluminum, an identical structural motif can be obtained with 100,000 times longer laser pulses if minimal amounts of iodine vapor are added as reactive species. More information can be found in the Article by Eike G. Hübner and co‐workers.