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Reversible Modification of the Structural and Electronic Properties of a Boron Nitride Monolayer by CO Intercalation
Author(s) -
Ng May Ling,
Shavorskiy Andrey,
Rameshan Christoph,
Mikkelsen Anders,
Lundgren Edvin,
Preobrajenski Alexei,
Bluhm Hendrik
Publication year - 2015
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.201500031
Subject(s) - monolayer , boron nitride , intercalation (chemistry) , boron , materials science , nitride , chemistry , inorganic chemistry , nanotechnology , crystallography , organic chemistry , layer (electronics)
We demonstrate the reversible intercalation of CO between a hexagonal boron nitride (h‐BN) monolayer and a Rh(111) substrate above a threshold CO pressure of 0.01 mbar at room temperature. The intercalation of CO results in the flattening of the originally corrugated h‐BN nanomesh and an electronic decoupling of the BN layer from the Rh substrate. The intercalated CO molecules assume a coverage and adsorption site distribution comparable to that on the free Rh(111) surface at similar conditions. The pristine h‐BN nanomesh is reinstated upon heating to above 625 K. These observations may open up opportunities for a reversible tuning of the electronic and structural properties of monolayer BN films.