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New Deposition Technique for Metal Films Containing Inorganic Fullerene‐Like (IF) Nanoparticles
Author(s) -
Goldbart Ohad,
Yoffe Alexander,
Cohen Sidney R.,
Rosentsveig Rita,
Feldman Yishay,
Rapoport Lev,
Tenne Reshef
Publication year - 2013
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.201201003
Subject(s) - materials science , physical vapor deposition , nanoparticle , evaporation , titanium , deposition (geology) , thin film , anti reflective coating , nanotechnology , chemical engineering , fullerene , atomic layer deposition , tungsten disulfide , substrate (aquarium) , chemical vapor deposition , fabrication , layer (electronics) , composite material , metallurgy , chemistry , organic chemistry , alternative medicine , oceanography , pathology , engineering , biology , paleontology , thermodynamics , medicine , physics , sediment , geology
This study describes a new method for fabrication of thin composite films using physical vapor deposition (PVD). Titanium (Ti) and hybrid films of titanium containing tungsten disulphide nanoparticles with inorganic fullerene‐like structure (Ti/IF‐WS 2 ) were fabricated with a modified PVD machine. The evaporation process includes the pulsed deposition of IF‐WS 2 by a sprayer head. This process results in IF‐WS 2 nanoparticles embedded in a Ti matrix. The layers were characterized by various techniques, which confirm the composition and structure of the hybrid film. The Ti/IF‐WS 2 shows better wear resistance and a lower friction coefficient when compared to the Ti layer or Ti substrate. The Ti/IF films show very good antireflective properties in the visible and near‐IR region. Such films may find numerous applications, for example, in the aerospace and medical technology.