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Tailoring Broadband Antireflection on a Silicon Surface through Two‐Step Silver‐Assisted Chemical Etching
Author(s) -
Chen ChiaYun,
Li WenJin,
Chen HsinHwa
Publication year - 2012
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.201100981
Subject(s) - nanostructure , materials science , etching (microfabrication) , silicon , isotropic etching , optoelectronics , broadband , nanotechnology , reflectivity , optics , layer (electronics) , physics
Combined nanostructure arrays with tailored structural profiles are presented (see picture, GN: graded nanostructure). These arrays exhibit a sharp decrease in reflectivity when submitted to strong sunlight irradiation, showing great potential for diverse applications, such as optical and electro‐optical devices and other antireflection designs.