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Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
Author(s) -
Dabirian Ali,
Kuzminykh Yury,
Wagner Estelle,
Benvenuti Giacomo,
Rushworth Simon A.,
Hoffmann Patrik
Publication year - 2011
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.201100637
Subject(s) - chemical vapor deposition , flux (metallurgy) , kinetics , desorption , deposition (geology) , chemical engineering , chemistry , chemical physics , materials science , nanotechnology , analytical chemistry (journal) , adsorption , organic chemistry , physics , paleontology , quantum mechanics , sediment , engineering , biology
Laser‐assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser‐assisted CVD processes whereas flux‐ and desorption‐limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture).