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Ablation and Deposition of Poly(dimethylsiloxane) with X‐Rays
Author(s) -
Weon Byung Mook,
Kwon Yong Bum,
Won Kyu Hwang,
Yoo Jewon,
Je Jung Ho,
Li Ming,
Hahn Jong Hoon
Publication year - 2010
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.200900841
Subject(s) - rendering (computer graphics) , nanostructure , ablation , deposition (geology) , contact angle , irradiation , nanotechnology , materials science , molecule , chemical engineering , chemistry , computer science , computer graphics (images) , geology , organic chemistry , physics , composite material , sediment , paleontology , nuclear physics , engineering , aerospace engineering
An efficient and practical protocol in atmospheric and room‐temperature conditions for the direct surface modification of PDMS is achieved using X‐ray irradiation. This enables not only to “ablate” hydrophobic molecules from PDMS, rendering the surface hydrophilic, but also to “deposit” them on flat and nanostructure surfaces, inducing hydrophobic surfaces (see picture).