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Electrodeposition of Metals and Semiconductors in Air‐ and Water‐Stable Ionic Liquids
Author(s) -
Zein El Abedin Sherif,
Endres Frank
Publication year - 2006
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.200500288
Subject(s) - ionic liquid , semiconductor , ionic bonding , electrochemistry , electrochemical window , materials science , inorganic chemistry , chemical engineering , chemistry , ion , ionic conductivity , electrode , organic chemistry , catalysis , optoelectronics , electrolyte , engineering
In addition to their stability, the advantages of air‐ and water‐stable ionic liquids over chloroaluminate ionic liquids, which were intensively investigated in the past, are that they are easy to dry, purify, and handle. Moreover, some of these ionic liquids have an extremely large electrochemical window of more than 5 V, and hence they give access to the electrodeposition of many metals and semiconductors, such as Ta, Ti, Si, and Ge. The results to date for the electrodeposition of metals and semiconductors in the most popular air‐ and water‐stable ionic liquids are presented.