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Generation and Spectroscopic Characterization of Methylnitrene Diradicals Adsorbed on the Cu(110) Surface
Author(s) -
Zhai RunSheng,
Chan Yuet Loy,
Hsu ChienKui,
Chuang Ping,
Klauser Ruth,
Chuang Tung J.
Publication year - 2004
Publication title -
chemphyschem
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.016
H-Index - 140
eISSN - 1439-7641
pISSN - 1439-4235
DOI - 10.1002/cphc.200400012
Subject(s) - radical , characterization (materials science) , chemistry , mass spectrometry , photochemistry , adsorption , copper , desorption , photoemission spectroscopy , spectroscopy , ultraviolet , thermal desorption , x ray photoelectron spectroscopy , analytical chemistry (journal) , materials science , nanotechnology , organic chemistry , chemical engineering , physics , optoelectronics , chromatography , quantum mechanics , engineering
Important radical: A novel method to generate pure methylnitrene radicals on copper surfaces and their characterization by ultraviolet photoemission (see spectrum), vibrational spectroscopy and thermal desorption mass spectrometry are presented. The radical may play an essential role in various heterogeneous reactions.