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Cover Picture: Monolithic, Crystalline MOF Coating: An Excellent Patterning and Photoresist Material (ChemNanoMat 5/2015)
Author(s) -
Wang Zhengbang,
Liu Jinxuan,
Grosjean Sylvain,
Wagner Danny,
Guo Wei,
Gu Zhigang,
Heinke Lars,
Gliemann Hartmut,
Bräse Stefan,
Wöll Christof
Publication year - 2015
Publication title -
chemnanomat
Language(s) - English
Resource type - Reports
SCImago Journal Rank - 0.947
H-Index - 32
ISSN - 2199-692X
DOI - 10.1002/cnma.201500114
Subject(s) - photoresist , materials science , homogeneous , coating , cover (algebra) , nanotechnology , structuring , epitaxy , metal organic framework , surface modification , thin film , front cover , optoelectronics , layer (electronics) , chemical engineering , chemistry , organic chemistry , mechanical engineering , engineering , physics , finance , adsorption , economics , thermodynamics
The Front Cover illustrates the photopatterning of metal–organic framework (MOF) thin films. Azido‐ and alkyne‐based SURMOFs (surface‐anchored MOFs) were prepared using a liquid‐phase epitaxial (LPE) process using an automated spray system. Lateral structuring of these monolithic, highly homogeneous coatings was achieved by photo‐controlled post‐synthetic modification (PSM) of the ligands comprising the molecular framework. More details can be found in the Full Paper by C. Wöll, et al. on page 338 in Issue 5, 2015 . (DOI: 10.1002/cnma.201500031).