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Degradation of Phenol in Aqueous Solution by Fenton, Sono‐Fenton and Sono‐photo‐Fenton Methods
Author(s) -
Babuponnusami Arjunan,
Muthukumar Karuppan
Publication year - 2011
Publication title -
clean – soil, air, water
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.444
H-Index - 66
eISSN - 1863-0669
pISSN - 1863-0650
DOI - 10.1002/clen.201000072
Subject(s) - phenol , chemistry , aqueous solution , degradation (telecommunications) , fenton reaction , hydroxyl radical , nuclear chemistry , oxygen , hydrogen peroxide , environmental chemistry , radical , organic chemistry , telecommunications , computer science
The present work focuses on the performance of Fenton, sono‐Fenton, and sono‐photo‐Fenton processes for the oxidation of phenol present in aqueous solution. The effects of H 2 O 2 concentration, Fe 2+ concentration, pH, and initial phenol concentration on the oxidation of phenol were studied. The optimum Fe 2+ and H 2 O 2 concentrations for the Fenton process were 45 and 800 mg/L, respectively. For the sono‐Fenton process, the optimum Fe 2+ and H 2 O 2 concentrations were 30 and 800 mg/L, respectively. The optimal conditions for the sono‐photo‐Fenton process were found to be 20 mg/L of Fe 2+ and 700 mg/L of H 2 O 2 . The optimum pH was found to be 3 for the processes investigated in the present study. The analysis of results showed that the sono‐photo‐Fenton method reduced the Fe 2+ concentration by 30–50% and the H 2 O 2 concentration by 12.5%. It was found that the sono‐photo‐Fenton technique showed better performance than the Fenton and sono‐Fenton processes for the oxidation of phenol. A lumped kinetic model was used to predict the chemical oxygen demand reduction and the model was found to fit the data.