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A Study of Electron Beam Induced Deposition and Nano Device Fabrication Using Liquid Cell TEM Technology
Author(s) -
Chen Xin,
Zhou Lihui,
Wang Ping,
Cao Hongliang,
Miao Xiaoli,
Wei Feifei
Publication year - 2014
Publication title -
chinese journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.28
H-Index - 41
eISSN - 1614-7065
pISSN - 1001-604X
DOI - 10.1002/cjoc.201400139
Subject(s) - transmission electron microscopy , electron beam induced deposition , fabrication , nano , chemistry , deposition (geology) , nanotechnology , cathode ray , electron , electron microscope , scanning electron microscope , analytical chemistry (journal) , optoelectronics , materials science , optics , composite material , scanning transmission electron microscopy , organic chemistry , medicine , paleontology , alternative medicine , physics , pathology , quantum mechanics , sediment , biology
SiC x nano dots and nano wires with sizes from 60 nm to approximately 2 µm were fabricated using liquid cell transmission electron microscope (TEM) technology. A SiCl 4 in CH 2 Cl 2 solution was sealed between two pieces of Si 3 N 4 window grids in an in situ TEM liquid cell. Focused 200 keV electron beams were used to bombard the sealed precursors, which caused decomposition of the precursor materials, and deposition of the nano materials on the Si 3 N 4 window substrates. The size of nano dots increased with beam exposure time, following an approximately exponential relationship with the beam doses. Secondary electrons are attributed as the primary sources for the Si and C reduction. A nano device was formed from a deposited nano wire, with its electrical property characterized.