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Preparation of a Novel COOH Ion Implantation Sensor and Its Application
Author(s) -
GAO DongMei,
ZHAO DanLing,
HU JingBo,
LI QiLong
Publication year - 2008
Publication title -
chinese journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.28
H-Index - 41
eISSN - 1614-7065
pISSN - 1001-604X
DOI - 10.1002/cjoc.200890006
Subject(s) - chemistry , x ray photoelectron spectroscopy , detection limit , cyclic voltammetry , analytical chemistry (journal) , electrode , electrochemistry , scanning electron microscope , ion , electrochemical gas sensor , voltammetry , dna , nuclear chemistry , chemical engineering , chromatography , organic chemistry , materials science , biochemistry , composite material , engineering
A novel ion implantation sensor (DNA/COOH/ITO) based on DNA immobilization in COOH/ITO probe was manufactured for the first time. The surface morphologies of the electrodes were characterized by X‐ray photoelectron spectroscopy (XPS), field‐emission‐scanning electron microscopy (FSEM) and electrochemical methods. In a 0.5 mol/L PBS solution, a sensitive oxidation peak of DNA on the COOH/ITO electrode was obtained by voltammetry. The electrochemical behavior of DNA was studied. And the oxidative peak potential of DNA was +0.400 V (vs. Ag/AgCl). Its peak current was proportional to the concentration of DNA over the range of 1.0×10 −8 −1.0×10 −6 mol/L with a detection limit of 5.0×10 −9 mol/L (about 0.5 ng/mL). This sensor was applied to the direct detection of DNA samples.