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STM image of tungstosilicic acid molecular layer on highly oriented pyrolytic graphite
Author(s) -
Zhang BaiLin,
Wang ErKang
Publication year - 1995
Publication title -
chinese journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.28
H-Index - 41
eISSN - 1614-7065
pISSN - 1001-604X
DOI - 10.1002/cjoc.19950130604
Subject(s) - chemistry , scanning tunneling microscope , pyrolytic carbon , graphite , highly oriented pyrolytic graphite , layer (electronics) , crystallography , molecule , nanotechnology , organic chemistry , materials science , pyrolysis
Molecular layer of tungstosilicic acid (H 4 SiW 12 O 40 ) deposited on freshly‐cleaved highly oriented pyrolytic graphite (HOPG) was observed by scanning tunneling microscopy (STM) in air at room temperature. The molecular dimension (11.5 Å) of H 4 SiW 12 O 40 measured by STM is consistent with known crystallographic parameter. We also imaged the boundary of H 4 SiW 12 O 40 molecular layer on HOPG showing that molecular layer of H 4 SiW 12 C 40 was formed. It has been proved that individual tungstosilicic acid species is imaged. The probable reason for the formation of the molecular layer is also discussed.