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An investigation of chemically deposited Ni‐P alloys by EXAFS and XRD
Author(s) -
Ma LiDun,
Lü Gang,
Shen XiaoLiang
Publication year - 1990
Publication title -
chinese journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.28
H-Index - 41
eISSN - 1614-7065
pISSN - 1001-604X
DOI - 10.1002/cjoc.19900080308
Subject(s) - nickel , chemistry , amorphous solid , crystallography , atom (system on chip) , diffraction , crystal structure , crystal (programming language) , reflection (computer programming) , extended x ray absorption fine structure , absorption spectroscopy , optics , programming language , physics , organic chemistry , computer science , embedded system
Five samples of chemically desposited Ni‐P amorphous alloys were prepared and investigated. In these amorphous alloys there are Ni‐P atom groups in which phosphorus and nickel are connected with strong interaction. Nickel atoms and Ni‐P groups are deposited in a random manner on the surface of matrix and a quasilayer structure is formed. The spacing between two layers in alloys resembles that in (111) plane in the nickel crystal. Therefore there is a peak at the same position of 2θ=44.4° as that of the (111) reflection of crystalline nickel in the X‐ray powder diffraction pattern of alloys. However, the dimension of Ni‐P groups is different from that of a nickel atom and the atomic arrangement in the layer is in disorder. These result in the space change and there is a distribution of spacing around the average. As a consequence of distribution of spacings, the peak at 2θ=44.4° is broadened and enhanced as the amount of P increases.