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Optimization of Reaction Conditions in a Fluidized‐Bed for Silane Pyrolysis
Author(s) -
TejeroEzpeleta Maria P.,
Buchholz Sigurd,
Mleczko Leslaw
Publication year - 2004
Publication title -
the canadian journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.404
H-Index - 67
eISSN - 1939-019X
pISSN - 0008-4034
DOI - 10.1002/cjce.5450820313
Subject(s) - silane , fluidized bed , pyrolysis , chemical vapor deposition , materials science , homogeneous , chemical engineering , silicon , decomposition , thermal decomposition , space velocity , deposition (geology) , polycrystalline silicon , chemistry , thermodynamics , composite material , nanotechnology , metallurgy , organic chemistry , catalysis , engineering , physics , paleontology , thin film transistor , layer (electronics) , sediment , biology , selectivity
The fluidized‐bed chemical vapor deposition (CVD) process for polycrystalline silicon production is considered to be the most attractive alternative to the conventional bell‐jar process. In order to obtain stable operation, high space‐time‐yields and high purity of the product several obstacles have to be eliminated. Reaction conditions must be optimized to avoid the homogeneous decomposition of silane and minimize silicon dust formation. The effect of temperature, silane partial pressure, gas velocity and the size of bed particles has to be identified. These dependencies and the interaction between hydrodynamics and kinetics of homogeneous and heterogeneous CVD‐reactions were studied in a laboratory‐scale fluidized‐bed reactor.