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Yield Stress Measurement of Silicon Nitride Suspensions
Author(s) -
Zhu Lixuan,
Papadopoulos Kyriakos,
De Kee Daniel
Publication year - 2002
Publication title -
the canadian journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.404
H-Index - 67
eISSN - 1939-019X
pISSN - 0008-4034
DOI - 10.1002/cjce.5450800619
Subject(s) - materials science , yield (engineering) , rheometer , silicon nitride , stress (linguistics) , creep , composite material , silicon , suspension (topology) , nitride , rheology , metallurgy , layer (electronics) , mathematics , linguistics , philosophy , homotopy , pure mathematics
Yield stress values of silicon nitride suspensions were measured via a novel slotted plate device and a constant stress rheometer and the results were compared. Test platform velocity, associated with the slotted plate method, was found to have a substantial effect on dynamic yield stress but not on static yield stress. The effects of suspension concentration and temperature on yield stress values were investigated. Yield stress measurements on mixtures of silicon nitride and alumina particles, as well as creep tests were performed.