z-logo
Premium
Factors affecting cake resistance in non‐Newtonian filtration
Author(s) -
Kozicki W.
Publication year - 1990
Publication title -
the canadian journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.404
H-Index - 67
eISSN - 1939-019X
pISSN - 0008-4034
DOI - 10.1002/cjce.5450680109
Subject(s) - slurry , filtration (mathematics) , adsorption , aqueous solution , materials science , calcium carbonate , polymer , filter cake , chemical engineering , composite material , particle size , slip (aerodynamics) , newtonian fluid , mineralogy , chemistry , chromatography , thermodynamics , mathematics , organic chemistry , statistics , physics , engineering
A methodology for evaluation of surface effects including polymer adsorption‐gel formation or slip within the pores of a filter cake has been developed and applied to constant pressure filtration of calcium carbonate in aqueous hydroxyethyl cellulose (Natrosol 250G, Hercules Powder Company) slurries. The fundamental framework of non‐Newtonian filtration is generalized to include the Blake, Kozeny‐Ergun and Kozeny‐Carman cake models and the cake resistances γ K and α R , in conjunction with the correction terms J RN and J gen , within a unified framework. Relationships are developed between the latter quantities and the effect of the bed model on the evaluations of the filtration characteristics is delineated. Significant polymer adsorption‐gel formation was found to take place in the constant pressure filtration of calcium carbonate in aqueous Natrosol 250G slurries. The resultant cake porosities were larger and the effective cake porosities lower than comparable porosities for cakes deposited from water slurries. The wide variation of J RN with the characteristic index N is attributed to the small size of the slurry particles. Polymer adsorption is shown to extend, and slip on the particle surface to reduce the variation of J RN with N .

This content is not available in your region!

Continue researching here.

Having issues? You can contact us here