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The plasma production of ultrafine silica particles
Author(s) -
Gans I.,
Gauvin W. H.
Publication year - 1988
Publication title -
the canadian journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.404
H-Index - 67
eISSN - 1939-019X
pISSN - 0008-4034
DOI - 10.1002/cjce.5450660314
Subject(s) - plasma , materials science , dissociation (chemistry) , quenching (fluorescence) , chemical engineering , argon , oxygen , amorphous silica , amorphous solid , chemistry , organic chemistry , physics , engineering , quantum mechanics , fluorescence
Abstract A process for producing ultrafine silica particles incorporating a plasma transferred‐arc reactor of novel design (Plas‐macan) was developed. The process consisted of vapourizing small particles of sand (99.5% SiO 2 ) which subsequently dissociated into SiO gas and oxygen in the presence of an argon plasma. Quenching of this gaseous mixture reconstituted SiO 2 in the form of an aerosol. Various reacting media (H 2 , steam or NH 3 ) were tested to assist the dissociation and to enhance the properties of the particles produced. The quenching of the particles was effected with oxygen or steam. A feedrate of 1.3 kg/h SiO 2 and a power of 30 kW for plasma generation were used throughout the work. Amorphous silica particles, average 0.07 μm in diameter, were produced.