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Calculation of binary vapor composition from solution vapor pressure
Author(s) -
MacKay D.,
Wong K. K.
Publication year - 1970
Publication title -
the canadian journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.404
H-Index - 67
eISSN - 1939-019X
pISSN - 0008-4034
DOI - 10.1002/cjce.5450480201
Subject(s) - fugacity , binary number , vapor pressure , composition (language) , thermodynamics , algebraic number , algebraic equation , mathematics , materials science , chemistry , physics , mathematical analysis , arithmetic , linguistics , philosophy , nonlinear system , quantum mechanics
A rigorous computational method is proposed for the calculation of binary vapour compositions from measurements of total vapour pressure of solutions of known composition and temperature. It is based on the repeated solution of an algebraic equation obtained by writing the Gibbs‐Duhem equation in terms of fugacity in finite difference form.