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Vakuum‐UV‐Oxidation als Methode zur Abwasserbehandlung
Author(s) -
Oppenländer Thomas,
Hall Jürgen,
Gröger Stephan
Publication year - 1996
Publication title -
chemie in unserer zeit
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.217
H-Index - 24
eISSN - 1521-3781
pISSN - 0009-2851
DOI - 10.1002/ciuz.19960300505
Subject(s) - oxidizing agent , radical , excimer , photochemistry , chemistry , oxidation process , advanced oxidation process , chemical engineering , catalysis , organic chemistry , optics , fluorescence , physics , engineering
The development of a novel generation of excimer UV lamps enables versatile applications of quasi‐monochromatic UV radiation. For example, xenon‐excimer flow‐through photoreactors may be used for wastewater treatment. The vacuum‐UV radiation (λ = 172 nm) initiates water cleavage with formation of H atoms and oxidizing hydroxyl radicals. The latter are responsible for the photomineralization of organic substrates. An automated model reactor demonstrates the basic concepts of this advanced oxidation process.