Premium
Vakuum‐UV‐Photolyse von gasförmigem Trichlormethan im Xenon‐Excimer‐Durchflußphotoreaktor
Author(s) -
Oppenländer Thomas
Publication year - 1997
Publication title -
chemie ingenieur technik
Language(s) - German
Resource type - Journals
SCImago Journal Rank - 0.365
H-Index - 36
eISSN - 1522-2640
pISSN - 0009-286X
DOI - 10.1002/cite.330690126
Subject(s) - art , physics , chemistry , art history